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  3. Characteristics of Ni-based ohmic contacts on n-type …

    Mar 15, 2021 · The nickel–silicon compound phase in both pulsed laser annealing (PLA) and rapid thermal annealing (RTA) samples is Ni 2 Si, which is confirmed by X-ray diffraction. The elemental analysis results prove that PLA samples …

  4. Nickel silicide - Wikipedia

  5. Nickel and nickel silicide Schottky barrier contacts to n-type …

  6. Phase transition of nickel silicide compounds and their electrical ...

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  8. A Wafer-Scale Ni-Salicide Contact Technology on n-Type 4H-SiC

  9. Process for nickel silicide Ohmic contacts to n-SiC

  10. The fabrication of nickel silicide ohmic contacts to n-type 6H …

  11. Challenges of nickel silicidation in CMOS technologies

  12. Ohmic Contact Mechanism for Ni/C-Faced 4H-n-SiC Substrate

  13. Nickel silicide encroachment formation and characterization

  14. Intermetallic nickel silicide nanocatalyst—A non-noble …

  15. A Wafer-Scale Ni-Salicide Contact Technology on n-Type 4H-SiC

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  17. Formation and role of graphite and nickel silicide in nickel based ...

  18. Potential of NiOx/Nickel Silicide/n+ Poly-Si Contact for Perovskite ...

  19. High-performance p-type field-effect transistors using ... - Nature